LUVUM Pore Reset Mud Mask
16 g
$27.97
LUVUM Pore Reset Mud Mask is a clay-infused sheet mask designed to absorb excess sebum, remove pore-clogging impurities, and refine uneven skin texture. Formulated with kaolin, bentonite, charcoal powder, mineral-rich sea silt, and PHA gluconolactone, it helps deeply cleanse congested-looking pores while gently exfoliating dead skin cells. Panthenol and allantoin provide soothing care, leaving skin feeling smoother, fresher, and more balanced after use.
Directions: After cleansing, remove the white protective film and place the upper and lower mask sections evenly over the face. Remove the transparent outer film and gently press the mud-coated sheet against the skin. Leave on for approximately 15-20 minutes, or until the mask begins to feel firm or tight. Remove the sheet and rinse away any remaining residue with lukewarm water.
- Deep Pore Cleansing: Contains 200,000 ppm kaolin and 34,000 ppm bentonite to help absorb excess oil, sebum, and impurities from the skin.
- Mineral-Rich Mud Complex: Sea silt and charcoal powder help purify congested-looking pores and leave the complexion feeling fresh and clean.
- Gentle PHA Exfoliation: Gluconolactone helps loosen accumulated dead skin cells and smooth rough-looking texture without abrasive scrubbing.
- Soothing Support: Panthenol and allantoin help comfort the skin during the clay-cleansing process.
- Convenient Mud Sheet: Combines the pore-cleansing benefits of a traditional clay mask with a fitted sheet format for more even and less messy application.
Water (Aqua), Kaolin, Butylene Glycol, Bentonite (CI 77004), Polysorbate 80, 1,2-Hexanediol, Magnesium Aluminum Silicate, Charcoal Powder, Sea Silt, Erythritol, Xanthan Gum, Palmitic Acid, Gluconolactone, Stearic Acid, Arginine, Allantoin, Panthenol, Ethylhexylglycerin, Disodium EDTA, Citric Acid, Salix Alba (Willow) Bark Extract, Ulmus Davidiana Root Extract, Pueraria Lobata Root Extract, Oenothera Biennis (Evening Primrose) Flower Extract, Pinus Palustris Leaf Extract, Tocopherol.
